Germany - Scanning electron microscopes

Description

An analytical field emission scanning electron microscope with an integrated scanning probe microscope is to be procured for the analysis of novel materials produced as part of research at the Center. The instrument is expected to provide very good material contrast in the detection of secondary and backscattered electrons. Local chemical analyses will be performed with high spatial resolution using energy dispersive X-ray spectroscopy (EDX). A detection of local crystalline properties is planned via electron backscatter diffraction (EBSD). This requires controlled focused ion beam preparation of the sample surface. The integrated scanning probe microscope should allow correlated analyses, e.g., in addition to recording topography, among other things, a measurement of electronic and thermal properties.The advantage of combining a scanning electron microscope and scanning probe microscope in one instrument is that the electron beam and scanning probe can be used both as detectors, to record different local interaction products at the same sample location, and as actuators, to modify local sample properties. These hybrid measurement techniques, in contrast to purely scanning electron or purely scanning probe microscopy techniques, give access to a variety of other relevant sample properties with the highest spatial resolution.
- Delivery, set-up and environmentally friendly disposal of packaging must be included in the offer.- The instrument must be offered as a new instrument.- Support via telephone or video conference at least during normal business hours (Mon.-Fri. 09:00 - 17:00).- At least 12 months warranty for all components.- Full spare parts availability must exist for at least 10 years.- The device must ensure imaging with spatial resolution < 1 nm at high primary electron energies of > 15 keV and spatial resolution < 1.5 nm at low acceleration energies < 1 keV.- The device must be able to detect the presence of a contamination in the sample. A device to clean up contamination on the sample surface must be available.- The instrument must have inlens secondary, inlens backscattered electron as well as STEM detector detectors.- The instrument must be equipped with an additional secondary electron detector.- The instrument must allow electron beam lithography of nanometer devices.- The instrument must have EDX microanalysis.- The instrument must ensure reliable detection of elements with low atomic numbers (> Be). Point analysis and mapping must be possible.- The instrument must have a database that allows assignment of numerous material spectra.- The instrument must have the ability to avoid sample charging by the primary electron beam at high energies for electrically poorly conducting materials.- The instrument must be equipped with an EBSD system with a fast detection unit.- The instrument must ensure that local crystalline properties can be detected. Point analysis and mapping must be possible.- For EBSD, tomography and cross-section analysis of layered systems, the instrument must be equipped with a fully integrated FIB system.- The FIB system must allow local nanometer layers to be ablated stepwise (tomography).- The system must have a secondary ion detector. There must be an in situ sample preparation capability.- There must be a system to support etching processes for thicker sample structures.- The instrument must be equipped with an integratable scanning probe microscope.- There must be sample transfer under vacuum.- The system must have a secondary ion detector. The system must have the ability to perform AFM-based nanoanalyses, such as KPFM, c-AFM, and SThM, using a laser deflection unit without restriction in addition to topography detection.- The instrument must have a sample lock system that ensures sample transfer from a glove box under inert gas into the instrument without exposing the samples to air.- The instrument must also have a sample lock system that ensures sample transfer from a glove box under inert gas into the instrument without exposing the samples to air. The sample lock system must also ensure sample transfer from a glove box under inert gas into the instrument in scanning probe microscope mode without exposing the samples to air.- The instrument must have a CE certificate and X-ray approval or type approval according to RöV guidelines.

Opportunity closing date

15 August 2022

Value of contract

to be confirmed