Germany - Laboratory equipment, optical instruments and precision instruments (except glasses)

Description

A powerful lithography system is required with which structures can be defined on length scales from 30 nm to above 1 mm in suitable resist in order to produce functional nanostructures by subsequent processes such as metal deposition and wet chemical etching. In addition, the system should enable high-resolution imaging of the topography of nanostructures.2 devices are required to meet these requirements, which work with different lithography technologies.the performance is divided into 2 lots:- Lot 1: System for maskless, parallel photolithography;- Lot 2: System for AFM-based thermolithography.
Ready to use, configured system consisting of exposure unit, sample positioning (XYZ and rotation), suitable lenses, control computer with monitor and software, including delivery and instruction of the users on site.operating principle: a sample coated with photosensitive resist is exposed by the system with a light intensity pattern generated by a micro LCD projector. The size of the intensity pattern on the sample can be adjusted by selecting suitable imaging lenses. Exposure is parallel, i.e. the entire intensity pattern is exposed simultaneously on the sample. Ready-to-operate, configured system consisting of atomic force microscope with thermolithography functionality, antivibration platform, control computer with monitor and software, and initial equipment of AFM tips, including delivery and instruction of the users on site.Operating principle: in a sample coated with heat-sensitive resist, the system uses a heatable AFM tip to subliminate the resist locally and thus transfer a freely selectable structure into the resist. The topography of the sample and the resist layer can be recorded by the AFM independently of the writing process and used as feedback for the writing process (closed-loop lithography).

Opportunity closing date

23 September 2020

Value of contract

to be confirmed